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System and Method for Sub-Diffraction-Limited Patterning

Invention SummaryMethod for creating nanoscale patterns using long wavelength photons and traditional photolithography. The technique involves the use of a switchable photoresist material that can be scanned in an iterative process prior to a locking step required for final processing. Nanoscale physical features beyond the diffraction limits of extreme...

Published: 5/6/2019 | Inventor(s): Rajesh Menon, Precious Cantu

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Category(s): Imaging, Software